Index of /Public/Reference/Deposition

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[   ]Evaporated metal film stress.PDF14-Dec-2011 09:36 471K 
[   ]Low Stress Si3N4 PECVD recipe.pdf30-Nov-2012 14:14 50K 
[   ]PECVD chamber clean recipes.docx30-Nov-2012 14:25 12K 
[   ]PECVD of silicon nitride and oxide.pdf14-Dec-2011 10:12 203K 
[IMG]PECVD parameter effects.JPG04-Dec-2013 09:18 95K 
[   ]Properties of deposition materials.pdf02-Dec-2011 13:05 8.0M 
[   ]Si3N4 PECVD recipe.pdf30-Nov-2012 14:14 35K 
[   ]SiO2 PECVD recipe.pdf30-Nov-2012 14:14 31K 
[   ]SiON PECVD recipe.pdf30-Nov-2012 14:14 40K 
[   ]Telemark thin film evaporation guide.pdf02-Dec-2011 14:45 171K 
[   ]Thermal evaporation in vacuum.docx02-Dec-2011 13:05 19K 
[   ]ThinFilmEvapMatSrcRef.pdf14-Dec-2011 09:36 98K 
[   ]WCAM Film Stress Values.xls02-Dec-2011 14:01 37K 
[   ]WCAM deposition materials.doc02-Dec-2011 16:29 60K 
[TXT]nitridetube.html27-Jul-2012 09:01 3.5K 

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