Index of /Public/Reference/PlasmaEtch

[ICO]NameLast modifiedSizeDescription

[DIR]Parent Directory  -  
[   ]Aluminum RIE recipe (Trion).pdf30-Nov-2012 14:45 53K 
[   ]Aluminum RIE recipe.pdf30-Nov-2012 14:15 51K 
[   ]BoschProc-STS.pdf03-Apr-2013 10:20 2.9M 
[   ]Chlorine Based RIE-ICP of Single Crystal and Polysilicon.pdf03-Apr-2013 10:20 112K 
[   ]Cr mask RIE recipe.pdf30-Nov-2012 14:15 34K 
[   ]ECR of semiconductor materials.pdf14-Dec-2011 10:28 238K 
[   ]Etch Rates for Micromachining Processing - Part II.pdf08-Apr-2014 13:34 1.0M 
[   ]Etch Rates for Micromachining Processing.pdf08-Apr-2014 13:34 1.5M 
[   ]Etching.pdf23-Apr-2014 14:59 501K 
[   ]Etching Si, SiO2, and PR.pdf10-Feb-2012 15:53 472K 
[   ]GaAs and AlGaAs RIE recipe.pdf30-Nov-2012 14:15 57K 
[   ]InP and InGaAsP RIE recipe.pdf30-Nov-2012 14:15 37K 
[   ]Introduction to Dry Etching.pdf14-Dec-2011 10:28 2.2M 
[   ]Photoresist and Polyimide RIE recipe.pdf30-Nov-2012 14:15 46K 
[   ]Plasma paper.pdf07-Aug-2013 10:58 375K 
[   ]Poly RIE recipe (Trion).pdf30-Nov-2012 14:45 29K 
[   ]Poly and Si REI recipe.pdf30-Nov-2012 14:15 63K 
[   ]Polyimide RIE recipe (Trion).pdf30-Nov-2012 14:45 47K 
[   ]Polysilicon etch.pdf14-Dec-2011 08:42 817K 
[   ]Polysilicon etch profile control.pdf14-Dec-2011 08:42 711K 
[   ]Selective RIE of P Doped Polysilicon.pdf14-Dec-2011 08:42 125K 
[   ]Selective RIE of nitride vs poly.pdf14-Dec-2011 08:42 92K 
[   ]Si3N4 RIE recipe (Trion).pdf30-Nov-2012 14:45 36K 
[   ]SiO2 RIE recipe (Trion).pdf30-Nov-2012 14:45 55K 
[   ]SiO2 and Si3N4 RIE recipes.pdf30-Nov-2012 14:15 152K 
[   ]WCAM etch gases.doc20-Jan-2015 11:08 59K 
[   ]XACTIX XeF2 Presentation.pdf08-Apr-2014 13:32 3.6M 
[   ]XeF2 & Graphene.pdf11-Apr-2014 13:28 321K 
[   ]XeF2_Unique.pdf08-Apr-2014 13:32 221K 

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